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JoMM“Special Issue on CAD Technologies”特刊发表

稿件来源: 发布时间:2021-01-21

  近期,澳门金沙国际注册:《Journal of Microelectronic Manufacturing》(JoMMISSN2578-3769)邀请李序武博士(Dr. Shiuh-Wuu Leeex-EVP and ex-CTO of SMIC)为本期专栏的客座编辑,出版了主题为“CAD Technologies”的特刊专栏。特刊文章的作者来自IntelUC BerkeleyTU BraunschweigU. of GlasgowSynopsysICRDAnchor SemiconductorIMECAS等国际著名集成电路企业、大学和研究机构。 

  JoMM旨在发表集成电路制造领域中从基础研究阶段到工业大规模量产阶段的研究成果,目前已被CrossrefDOAJCAS、知网、维普等数据库收录。JoMM的发表内容包括但不限于DesignProcessMetrology & Yield ControlPackagingMaterialsEquipment 等方面。  

       本期特刊文章如下: 

      Guest Editorial: Special Issue on CAD Technologies 

      Shiuh-Wuu Lee 

      2020 JoMM Volume 3, Issue 4: 20030401 


 

      BSIM-CMG compact model for IC CAD: from FinFET to Gate-All-Around FET Technology 

  Avirup Dasgupta, Chenming Hu. 

  2020 JoMM Volume 3, Issue 4: 20030402 

   On the History of the Numerical Methods Solving the Drift Diffusion Model 

  Bernd Meinerzhagen. 

  2020 JoMM Volume 3, Issue 4: 20030403 

  

  Nano-Electronic Simulation Software (NESS): A Novel Open-Source TCAD Simulation Environment 

  Cristina Medina-Bailon, Tapas Dutta, Fikru Adamu-Lema, Ali Rezaei, Daniel Nagy, Vihar P. Georgiev, Asen Asenov. 

  2020 JoMM Volume 3, Issue 4: 20030404 
 

 

  First-principles Simulations of Tunneling FETs Based on van der Waals MoTe2/SnS2 Heterojunctions with Gate-to-drain Overlap Design 

  Kun Luo, Kui Gong, Jiangchai Chen, Shengli Zhang, Yongliang Li, Huaxiang Yin, Zhenhua Wu. 

  2020 JoMM Volume 3, Issue 4: 20030405 

 

 

  Material Modeling in Semiconductor Process Applications 

  Boris A. VoinovPatrick H. KeysStephen M. CeaAnanth P. KaushikMark A. Stettler. 

  2020 JoMM Volume 3, Issue 4: 20030406 

 

 

  Fast and Accurate Machine Learning Inverse Lithography Using Physics Based Feature Maps and Specially Designed DCNN 

  Xuelong ShiYan YanTao ZhouXueru YuChen LiShoumian ChenYuhang Zhao. 

  2020 JoMM Volume 3, Issue 4: 20030407 

   Machine Learning based Optical Proximity Correction Techniques 

  Pengpeng Yuan, Taian Fan, Yaobin Feng, Peng Xu, Yayi Wei. 

  2020 JoMM Volume 3, Issue 4: 20030408  

 

  Enabling Variability-Aware Design-Technology Co-Optimization for Advanced Memory Technologies 

  Salvatore M. AmorosoPlamen AsenovJaehyun LeeNara KimKo-Hsin LeeYaohua TanYong-Seog OhLee SmithXi-Wei LinVictor Moroz. 

  2020 JoMM Volume 3, Issue 4: 20030409 
 

 

  Pattern-Centric Computational System for Logic and Memory Manufacturing and Process Technology Development 

  Chenmin HuKhurram ZafarAbhishek VikramGeoffrey Ying. 

  2020 JoMM Volume 3, Issue 4: 20030410 


   作为开放阅览电子学术期刊,JoMM致力于实现快速发表,稿件录用后即时上线,可阅览、下载、引用。目前JoMM正在进行2021年征稿,并免版面费,同时也在征集Special Issue的专题(topic is open),以及欢迎新编委、同行评审专家加入JoMM,详情请查看官网3d网上投注. 

       欢迎投稿! 

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